Real-time VOC monitoring in FOUP, fab and the clean-room environment
Airborne Molecular Contamination (AMC) is more and more taking center stage in today’s semiconductor manufacturing processes. In the past the focus was on filtering particles from the ambient air in the clean-room to reduce their negative impact on production yield. Using expensive air filtration equipment and transport containers for wafers, FOUPs – short for Front Opening Unified Pod, this problem is largely under control. While particles are still important, the contamination concern has shifted towards low-concentrated volatile molecules. These trace gases can be undesirable for semiconductor manufacturing processes and are therefore defined as airborne molecular contamination (AMC).
To monitor AMC directly at the photolithography tool-level and in the transport and storage environment, real-time analyzers with low online detection limits and versatile usage scenarios are needed.