VOCentinel

IONICONs' VOCentinel

The trace VOC analyzer for real-time quantification with minimal user interaction.

Automated VOC Monitoring

The VOCentinel provides continuous, real-time quantitative results of a wide range of VOCs with only minimal user interaction required, making it an ideal choice for long-term air-quality, environmental and industrial monitoring applications. 

Simple User Interface

The VOCentinel has a simple user interface for monitoring a predefined set of VOCs in realtime, including various relevant chemical classes, such as: 

  • amines 
  • aldehydes 
  • ketones 
  • alkenes 
  • monoterpenes 
  • siloxanes 
  • aromatics 

Still, all gathered raw data is accessible for evaluation and further scientific research. 

Robust Technology

Built on IONICON’s experience in robust industrial systems, the VOCentinel brings fully automated VOC monitoring to complex environmental applications. The instrument offers all benefits of a small footprint and low weight in a robust industry-proven setup. It is available as a benchtop instrument or as 19-inch rackmount version for easy integration into your monitoring station or mobile platforms.

Suggested further reading

Coquand, C., Borde, Y. (2024).
Monitoring of the airborne molecular contamination (AMC) in a semiconductor factory with a PTR-TOF-MS
Contributions to the 9th Int. Conf. on PTR-MS, p. 114–118

Herbig, J., Winkler, K., Herburger, A., Schober, C. (2024).
From Lab to Fab - Enhancing PTR-TOF for Industrial Monitoring
Contributions to the 9th Int. Conf. on PTR-MS, p. 119–123

Kenis, K., Mertens, P., Altamirano-Sanchez, E., Van Ongeval, J. De Vita, M. (imec, Pfeiffer Vacuum) (2023).
Monitoring of Trace Molecular Impurities in Clean-Room Air
Solid State Phenomena, Vol. 346, p. 183–188. DOI: 10.4028/p-BH3umg

Pic, N., Martin, C., Vitalis, M., Calarnou, T., Camlay, D., Grosjean, C., Lanier, A., Kames, J., Acksel, A., Galvez, C. (SPIE, Bellingham, WA 2010) 76380M.
Defectivity decrease in the photolithography process by AMC level reduction through implementation of novel filtration and monitoring solutions
Metrology, Inspection, and Process Control for Microlithography XXIV, edited by Christopher J. Raymond, Proceedings of SPIE Vol. 7638

 

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